Research [ASAP] High-Temperature Atomic Layer Deposition of Thermal-Oxide-Quality SiO2 Using Methyltrichlorosilane LikeLiked Date: January 1, 2026 Less than 1 MinRead Views: 14 ACS Applied Electronic Materials DOI: 10.1021/acsaelm.5c02008 Source: http://dx.doi.org/10.1021/acsaelm.5c02008 Tags:Materials Industry FacebookTwitterLinkedinWhatsAppTelegramEmail ALT-Lab-Ad-1ALT-Lab-Ad-2ALT-Lab-Ad-3ALT-Lab-Ad-4ALT-Lab-Ad-5ALT-Lab-Ad-6ALT-Lab-Ad-7ALT-Lab-Ad-8ALT-Lab-Ad-9ALT-Lab-Ad-10ALT-Lab-Ad-11ALT-Lab-Ad-12ALT-Lab-Ad-13 Recent Articles Barriers to replacing single-use packaging with circular reuse business models: A UK and Vietnamese context Research February 27, 2026 Assessing the sustainability and circularity of product families: A systematic review on indicators and methodologies Research February 27, 2026 Optimizing Soil Fertility and Crop Productivity Using Biodigestate, Poultry Manure, and NPK Integration Research February 26, 2026 Energy use and carbon emissions in high-performance computing: A case study for universities and reduction strategies Research February 26, 2026 Research February 26, 2026 The Rituals of Female Connection in Urban Galleys Built Environment February 26, 2026 Recovering acidic solid residues from wet chemical phosphorus recovery of sewage sludge ash in the production of cementitious composites Waste Management February 25, 2026 Solvent selection enables sustainable and affordable lignin biocomposite for cement-free construction Research February 25, 2026 [ASAP] Engineering Robust PEMFC Catalysts via a Dual-Pronged Stability Enhancement Strategy Research February 25, 2026 Research February 25, 2026 Load more
