Research [ASAP] Atomic-Layer-Deposited Aluminum Oxide (Al2O3) as a Barrier for Local Oxidation of Silicon LikeLiked Date: November 24, 2025 Less than 1 MinRead Views: 3 ACS Applied Electronic Materials DOI: 10.1021/acsaelm.5c01944 Source: http://dx.doi.org/10.1021/acsaelm.5c01944 Tags:Materials Industry FacebookTwitterLinkedinWhatsAppTelegramEmail ALT-Lab-Ad-1ALT-Lab-Ad-2ALT-Lab-Ad-3ALT-Lab-Ad-4ALT-Lab-Ad-5ALT-Lab-Ad-6ALT-Lab-Ad-7ALT-Lab-Ad-8ALT-Lab-Ad-9ALT-Lab-Ad-10ALT-Lab-Ad-11ALT-Lab-Ad-12ALT-Lab-Ad-13 Recent Articles Risk identification and prediction of corporate low-carbon transition via multi-agent reinforcement learning: Using OpenEI and CDP database Research December 26, 2025 Environmental impact assessment of multifunctional desalination systems Research December 26, 2025 Microwave-driven catalytic pyrolysis and reforming of methane for hydrogen production Research December 26, 2025 Nine Stunning Renovated Apartments in Oscar Niemeyer-Designed Buildings Built Environment December 26, 2025 Mexická Restaurant / 20-20 Architekti Built Environment December 26, 2025 Application of construction and demolition waste (gypsum and mortar) for the removal of metal ions, Pb2+, Cu2+, and Ni2+ Research December 26, 2025 The Rubber.er Cafe / SA-ARD studio Built Environment December 25, 2025 Charted: America’s Low-Wage Workers by Education Level Finance & investments December 25, 2025 Sustainable adsorption technologies for textile dye removal: Advances in biomass-derived and magnetically modified activated carbons Research December 25, 2025 Ranked: The World’s Most Spoken Languages by Total Speakers Finance & investments December 25, 2025 Load more
